Metrology, inspection, and process control for microlithography XXI (26 February- 1 March 2007, San Jose, California, USA)Archie, Chas N.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6637-2, 3 v, isbn 978-0-8194-6637-2Conference Proceedings

Mueller polarimetry in the back focal planeDE MARTINO, A; BEN HATIT, S; FOLDYNA, M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65180X.1-65180X.10, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Critical dimension : MEMS road mapPOULINGUE, Marc; KNUTRUD, Paul.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65184W.1-65184W.6, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Data sharing system for lithography APCKAWAMURA, Eiichi; TERANISHI, Yoshiharu; SHIMABARA, Masanori et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65182S.1-65182S.8, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Metrology challenges for advanced lithography techniquesENGLARD, Ilan; VANOPPEN, Peter; MASIA, Claudio et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65181G.1-65181G.9, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Overlay metrology tool calibrationBINNS, L. A; DASARI, P; SMITH, N. P et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65180I.1-65180I.9, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Process monitor gratingsBRUNNER, T. A; AUSSCHNITT, C. P.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651803.1-651803.9, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Realizing value-added metrologyBUNDAY, Benjamin; LIPSCOMB, Pete; CAIN, Jason et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65181K.1-65181K.21, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Accuracy in optical image modelingPOTZICK, James; MARX, Egon.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651814.1-651814.11, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Plasma-assisted cleaning by electrostatics (PACE)LYTLE, W. M; SHIN, H; RUZIC, D. N et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65183P.1-65183P.11, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Sub-nanometer CD-SEM matchingLOTT, Travis; ELIAS, Russell J.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651838.1-651838.11, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Blossom overlay metrology implementationAUSSCHNITT, C. P; CHU, W; FINK, H et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65180G.1-65180G.6, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Optimized molecular contamination monitoring for lithographyRODIER, D.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651844.1-651844.10, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

SEM metrology for advanced lithographiesBUNDAY, Benjamin; ALLGAIR, John; RICE, Bryan J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65182B.1-65182B.12, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

The coming of age of tilt CD-SEMBUNDAY, B; ALLGAIR, J; SOLECKY, E et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65181S.1-65181S.16, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

A new SEM CD operator verified against Monte Carlo simulationsFRASE, C. G; GNIESER, D; DIRSCHERL, K et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65184P.1-65184P.12, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

CAD based line/space mix-up prevention for reticle metrologyMARSCHNER, Thomas; ENGER, Maik; LUDEWIG, Frank et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65181W.1-65181W.8, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Characterization and adjustment of high performance objectives for DUV applicationsMÜLLER-PFEIFFER, Stefan; KÖRNER, Lienhard; FRANZ, Stefan et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65184Q.1-65184Q.11, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Correlation length and the problem of Line Width RoughnessCONSTANTOUDIS, V; PATSIS, G. P; GOGOLIDES, E et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65181N.1-65181N.10, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Ellipsometric studies of the absorption of liquid by photo resistJEONG, Hee; KYUNG, Jaisun; PARKA, Songyi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651849.1-651849.7, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Fundamental limits of optical critical dimension metrology : A simulation studySILVER, Richard; GERMER, Thomas; ATTOTA, Ravikiran et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65180U.1-65180U.17, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Improved overlay control through automated high order compensationWAKAMOTO, S; ISHII, Y; YASUKAWA, K et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65180J.1-65180J.8, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Köhler illumination analysis for high-resolution optical metrology using 193 nm lightSOHN, Yeung-Joon; SILVER, Richard M.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65184V.1-65184V.7, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Lithography process control using scatterometry metrology and semi-physical modelingLENSING, Kevin; CAIN, Jason; PRABHU, Amogh et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651804.1-651804.12, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

Meeting overlay requirements for future technology nodes with in-die overlay metrologySCHULZ, Bend; SELTMANN, Rolf; BUSCH, Jens et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65180E.1-65180E.11, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper